Physical Vapor Deposition

Thin Film Physical Vapor Deposition

Physical vapor deposition (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces (e.g., onto semiconductor wafers). Palmaz Scientific has taken this semiconductor process and applied it to the manufacture of thin film metals to produce stronger and higher purity metals for implantable medical devices. In addition, when vapor deposited metals are implemented in the manufacturing process of an implantable medical device, the micro-engineered have characteristics that allow for engineering of microscopic features that are added to the device structure and can induce powerful effects on cell behavior. The result of applying this process was found to accelerate colonization rates of the metal surface thereby improving healing. Faster healing prevents platelets and monocytes from occupying the prosthetic surface, potentially avoiding or causing inferior end results, such as restenosis, following a stenting procedure.